PECVD Working | Plasma Chemical Vapor Deposition system with preheating | Vacuum Furnace

It can deposit SiOx, SiNx, amorphous silicon, microcrystalline silicon, Nano silicon, SiC, diamond-like carbon, and other films on the surface of the sheet or similar shape samples, and can deposit p-type and n-type doped films. To learn more, visit our website: