A visit to ASML with a deep dive into diffraction and imaging:
0:00 Intro
3:14 How big big are chip patterns nowadays?
5:00 Arriving at ASML Veldhoven
5:50 Interview Sander Blok part 1
7:40 About diffraction and image formation
9:36 Fraunhofer (far field) interference / diffraction explained
11:15 Diffraction on photolithography masks
15:11 About critical dimension
17:27 Example of computational photolithography
19:23 Interview Sander Blok part 2
21:46 EUV is difficult...
by the way, the frequency of the tin droplets apparently is not per second.
Animations were made using a Phyton script for Nvidia cuda, which was supplied to me by @DiffractionLimited
The script with instructions to install it can be downloaded from github:
Third party images / video:
Sleepy guy:
Source mask optimization:
If you cannot access the article, search for the title in google: “ Source mask optimization using the covariance matrix adaptation evolution strategy“
Royalty free music used:
Road Trip - Slynk
Sharp Edges -
Floating - Early Birds
All imagery inside the ASML manufacturing facilities is stock video material shown Courtesy of ASML and IBM.
ASML YouTube Channel: @ASMLcompany
Want to work at ASML?:
Into viewing wave simulations? Nils Berglund has a ton of them:
Did I forget anyone? Please let me know and we will work it out.